photoresists

Nanotechnology

Acceleration of 3D nanofabrication using highly sensitive cationic photoresists

Credit: Pixabay/CC0 Public Domain Two-photon laser direct write lithography (TPL) is a state-of-the-art technique used to create nanoscale structures. It works by utilizing a specific material known as a photoresist, which changes its chemical properties when exposed to light. These materials absorb laser light in a unique way, allowing precise control during exposure to laser light. Unlike traditional ultraviolet (UV)…